Sadiqun, Maulana Malik (2017) Pengaruh Perbandingan Luas Area Target dan Tekanan Gas Nitrogen Pada Proses PVD Terhadap Sifat Antimicrobial Lapisan Tipis AgCu. Undergraduate thesis, Institut Teknologi Sepuluh Nopember.
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Abstract
Antimicrobial merupakan sifat yang terdapat pada beberapa logam mulia seperti; perak (Ag), emas (Au), atau tembaga (Cu), yang memiliki kemampuan menghambat perkembangan bakteri. Stainless Steel 316L biasa digunakan sebagai bahan implan atau Orthopedics karena memiliki ketahanan korosi yang kuat, akan tetapi material ini kurang mampu menghambat pertumbuhan bakteri pada permukaannya, sehingga tidak memiliki sifat antimicrobial. Oleh karena itu dibutuhkan bahan yang memiliki sifat antimicrobial untuk dilapiskan pada permukaan bahan tersebut.
Pada penelitian ini, digunakan logam Ag dan material Antimicrobial yang lain (Cu) untuk dijadikan material target pada proses pembentukan lapisan tipis dengan metode Physical Vapour Deposition (PVD). Metode Mozaik telah digunakan untuk menggabungkan kedua material tersebut agar dapat terdeposisi ke substrat menjadi lapisan tipis. Variasi perbandingan luas area target Ag:Cu (60:40, 70:30, 80:20) dan variasi penambahan gas Nitrogen (0,5x10-2 mbar, 1x10-2 mbar, 1,5x10-2 mbar) dilakukan untuk menganalisis pengaruhnya terhadap sifat antimicrobial lapisan tipis Ag-Cu. SEM-EDX, XRD, AFM, kekuatan adhesi, dan kemampuan antimicrobial secara in vitro dilakukan untuk karakterisasi lapisan tipis.
Perbandingan luas area target Ag:Cu menyebabkan perubahan pada komposisi lapisan tipis AgCu. Komposisi Ag paling besar didapatkan pada perbandingan luas area target Ag:Cu (80:20). Peningkatan komposisi Ag menyebabkan kemampuan antimicrobial meningkat pada lapisan tipis AgCu. Penambahan tekanan gas Nitrogen mempengaruhi kekasaran pada lapisan tipis AgCu. Meningkatnya tekanan gas Nitrogen menyebabkan kekasaran pada lapisan tipis menurun. Kekasaran permukaan mempengaruhi wettability pada lapisan tipis AgCu. Kemampuan antimicrobial paling baik didapatkan dengan penambahan tekanan gas Nitrogen optimal (1 x 10-2 mbar) pada proses PVD.====================================================================================================================Antimicrobial properties can prevent bacterial adhesion. It can be found on noble metal like Silver (Ag), Gold (Au), or Copper (Cu). Ag has historic performance in medicine due to its powerful microbial activity. Stainless Steel 316L is widely used for implant such as orthopedics implant because its excellent properties to prevent corrosion, but microbial could be exist on its surface because it does not have antimicrobial properties. Material with antimicrobial properties is needed as thin film on its surface to prevent bacterial adhesion.
In this research, Ag and Cu were used to become material target in thin film deposition process,Physical Vapour Deposition (PVD). Mosaic method was used to combine the materials which then deposited on the surface of substrate. Material target surface area ratio, Ag:Cu (60:40, 70:30, 80:20) and Pressure variable of Nitrogen gas (0,5x10-2 mbar, 1x10-2 mbar, 1,5x10-2 mbar) were used to determine their effect to antimicrobial properties of thin film Ag-Cu. SEM- EDX, XRD, AFM, Adhesion Test, and Antimicrobial Test in vivo were used to characterize the thin film.
Material target surface area ratio influences percentage composition of AgCu thin film. Highest Percentage of Ag Composition obtained by material target surface area with ratio Ag:Cu (80:20). Addition of Nitrogen pressure influences roughness of AgCu thin film. Increasing Nitrogen pressure would decrease roughness of AgCu thin film. Surface roughness affects wettability of Ag-Cu thin film. In this research, good antimicrobial properties was produced by optimum Nitrogen pressure (1 x 10-2 mbar) in PVD process.
| Item Type: | Thesis (Undergraduate) |
|---|---|
| Uncontrolled Keywords: | Antimicrobial, Lapisan Tipis, Physical Vapour Deposition, Orthopedics |
| Subjects: | Q Science T Technology > TP Chemical technology |
| Divisions: | Faculty of Industrial Technology > Material & Metallurgical Engineering > 28201-(S1) Undergraduate Thesis |
| Depositing User: | Maulana Malik Sadiqun |
| Date Deposited: | 28 Aug 2017 07:22 |
| Last Modified: | 05 Mar 2019 06:47 |
| URI: | http://repository.its.ac.id/id/eprint/43259 |
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