Langmuir Probe Study of Plasma Properties In HiPIMS Discharge For High Aspect-Ratio Metallic Nanotube Arrays (MeNTAs) Fabrication

Altama, Alfreda Krisna (2021) Langmuir Probe Study of Plasma Properties In HiPIMS Discharge For High Aspect-Ratio Metallic Nanotube Arrays (MeNTAs) Fabrication. Masters thesis, Institut Teknologi Sepuluh Nopember.

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Abstract

In the fabrication process of Metallic Nanotube Arrays (MeNTAs), photolithography was used to pattern a contact-hole array with aspect-ratio (AR) ~2 and 4 on the photoresist as the deposition template. After PVD deposition of the desired metallic film, the top layer and photoresist were removed using tweezers to get the MeNTAs. In this study, the deposition was performed using a 3-inch diameter target with HiPIMS and DCMS methods. The plasma properties were measured using a Langmuir probe (LP) located at 70 mm from the target face. The density of plasma (n0) and ion flux in HiPIMS and modes are about four times higher than conventional DC magnetron sputtering at the same applied power. We consider the experimental condition of high-density plasma and ion flux as the favorable process condition for the deposition. Further analysis was more focused on the HiPIMS method. In HiPIMS, a higher working pressure (4-10 mTorr) generally results in plasma with higher Vp and Te, but with a lower n0. Whereas for applied power, the density of the plasma gets higher with the higher applied power. Parameters with high plasma density result in high ion flux and deposition rates. It is necessary to control the plasma density to prevent the formation of overhang structures. Based on the SEM image analysis, plasma with a density of 4.33 x 1016 m-3 provides good step coverage in the deposition process of ZrCuAlNi alloy, and 7.91 x 1016 m-3 for Bronze-Al alloy. Single-layer MeNTAs with AR 2 successfully fabricated using both ZrCuAlNi and Bronze-Al alloy. For AR 4, single layer MeNTAs did not have good survival ability when the photoresist removal. The addition of a reinforcing layer in the form of WNiB is needed to strengthen the MeNTA structure. By using a multi-layer deposition process, the survivability of AR 4 Bronze-Al MeNTAs increased by 33%. Furthermore, this study's results can be used as a reference for trench filling and the manufacture of nanostructures with high aspect ratio using HiPIMS.

Item Type:	Thesis (Masters)
Uncontrolled Keywords:	high aspect ratio, HiPIMS, Langmuir probe, metallic nanotube arrays, aspek-rasio tinggi, HiPIMS, Langmuir probe, metallic nanotube arrays
Subjects:	T Technology > TS Manufactures > TS695 Physical/Chemical vapor deposition
Divisions:	Faculty of Industrial Technology > Material & Metallurgical Engineering > 27101-(S2) Master Thesis
Depositing User:	Alfreda Krisna Altama
Date Deposited:	01 Mar 2021 20:58
Last Modified:	01 Mar 2021 20:58
URI:	http://repository.its.ac.id/id/eprint/83062

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